A plot of the optimized squareness value, <i>n</i>, vs etch time.

<p>A plot of the optimized squareness value, <i>n</i>, vs etch time.</p

Chemically Engineered Graphene-Based 2D Organic Molecular Magnet

Carbon-based magnetic materials and structures of mesoscopic dimensions may offer unique opportunities for future nanomagnetoelectronic/spintronic devices. To achieve their potential, carbon nanosystems must have controllable magnetic properties. We demonstrate that nitrophenyl functionalized graphene can act as a room-temperature 2D magnet. We report a comprehensive study of low-temperature magnetotransport, vibrating sample magnetometry (VSM), and superconducting quantum interference (SQUID) measurements before and after radical functionalization. Following nitrophenyl (NP) functionalization, epitaxially grown graphene systems can become organic molecular magnets with ferromagnetic and antiferromagnetic ordering that persists at temperatures above 400 K. The field-dependent, surface magnetoelectric properties were studied using scanning probe microscopy (SPM) techniques. The results indicate that the NP-functionalization orientation and degree of coverage directly affect the magnetic properties of the graphene surface. In addition, graphene-based organic magnetic nanostructures were found to demonstrate a pronounced magneto-optical Kerr effect (MOKE). The results were consistent across different characterization techniques and indicate room-temperature magnetic ordering along preferred graphene orientations in the NP-functionalized samples. Chemically isolated graphene nanoribbons (CINs) were observed along the preferred functionality directions. These results pave the way for future magnetoelectronic/spintronic applications based on promising concepts such as current-induced magnetization switching, magnetoelectricity, half-metallicity, and quantum tunneling of magnetization

A plot showing the influence of SLIM process time and precursor thickness on the pattern width.

<p>Each curve approaches an asymptote at approximately 183nm revealing the self-limiting etch process.</p

SEM image of a 75nm wide square pattern fabricated by SLIM processing of a dot array with 100nm pitch.

<p>SEM image of a 75nm wide square pattern fabricated by SLIM processing of a dot array with 100nm pitch.</p

Illustration of the deep brain stimulation approach.

<p>Illustration of the deep brain stimulation approach.</p

Electric pulses in the brain of a patient with Parkinson's Disease.

<p>Typical electric pulsed sequences triggered in the four regions of the brain under study of a patient suffering from Parkinson's Disease before the treatment by the ME nanoparticles. Typical electric pulsed sequences triggered in the four regions of the brain under study of a patient suffering from Parkinson's Disease before the treatment by the ME nanoparticles.</p

A plot of pattern size vs etch time for different precursor openings showing little change in the pattern size distribution.

<p>A plot of pattern size vs etch time for different precursor openings showing little change in the pattern size distribution.</p

Nickel was electrodeposited into a SLIM pattern with 80nm square opening.

<p>The SEM images show a) a 52 degree projection of the nickel pillars after removing the resist and (b) a 52 degree projection of the same sample after argon plasma treatment.</p

Electric pulses of a Parkinson's patient after the invasive DBS treatment.

<p>Typical electric pulsed sequences triggered in the four regions of the brain under study of a patient suffering from Parkinson's Disease after a treatment by the invasive DBS procedure with electric signals.</p

Diagram describing the SLIM process.

<p>The precursor is dot patterns separated by a wall of thickness a₀ and b₀. SLIM processing narrows both walls at the same rate to a thickness of a₁ and b₁. At a critical thickness the etch rate reduces significantly resulting in little change towards a₂, but b₂ continues to narrow. As b₂ approaches the critical thickness, the pattern converges to a square.</p