18 research outputs found
Atmospheric-Pressure Plasma-Induced In Situ Polymerization of Liquid Silsesquioxane Monomer for the Synthesis of Polysilsesquioxane Nanocomposite Membranes with Sub-Nanometer Pores for Molecular Separation
Plasma-induced polymerization of liquid silsesquioxane
monomer
(1,2-bis(triethoxysilyl)ethane, BTESE) at the gas–liquid interface
was achieved at room temperature by employing an atmospheric-pressure
plasma jet. The polymerization of the liquid monomer under exposure
to atmospheric-pressure plasma resulted in the formation of a thin
polysilsesquioxane layer at the immediate surface of the porous support.
The confined polymerization at the plasma-liquid interface was demonstrated
to be beneficial for preparing nanocomposite membranes with a thin
selective layer on top of the porous support. The BTESE-derived polysilsesquioxane
membrane exhibited high selectivity for gas separation (H2/CH4 = 195) based on the molecular sieving mechanism
Fluorine Doping of Microporous Organosilica Membranes for Pore Size Control and Enhanced Hydrophobic Properties
Fluorine-doped
organosilica membranes for gas and pervaporation
(PV) separation were fabricated using a sol–gel method. NH<sub>4</sub>F and bis(triethoxysilyl)methane (BTESM) were selected as
the dopant and Si precursor, respectively, for the fabrication of
fluorine-doped organosilica membranes. Doping with fluorine was evaluated
for its effect on the physicochemical properties of organosilica (hydrophobicity/hydrophilicity
and network size). Fluorine doping dramatically eliminated the formation
of Si–OH groups in the sol, so that the condensation of Si–OH
groups during the calcination process was suppressed. It is possible
that fluorine doping enlarged the network pore sizes in organosilica,
because the F-BTESM (F/Si = 1/9) membrane showed superior He and H<sub>2</sub> permeance with a low H<sub>2</sub>/N<sub>2</sub> permeance
ratio that corresponded to the network pore size by comparison with
an undoped BTESM membrane. The F-BTESM (F/Si = 1/9) membranes clearly
showed a high level of C<sub>3</sub>H<sub>6</sub> permeance (>3.0
× 10<sup>–7</sup> mol m<sup>–2</sup> s<sup>–1</sup> Pa<sup>–1</sup>) with a high C<sub>3</sub>H<sub>6</sub>/SF<sub>6</sub> permeance ratio (∼250), which suggests that the network
pore size of F-BTESM is suitable for the separation of large molecules
such as hydrocarbon gases (C3/C4, C4 isomer, etc.). Organosilica membranes
both with and without fluorine doping showed stable PV performance
because of the fact that H<sub>2</sub>O permeance and each permeance
ratio under different separation systems was approximately constant
over 10 h at 70 °C. Fluorine doping enhanced the hydrophobic
nature of the organosilica, which was confirmed by the H<sub>2</sub>O adsorption and PV properties
Nanogradient Hydrophilic/Hydrophobic Organosilica Membranes Developed by Atmospheric-Pressure Plasma to Enhance Pervaporation Performance
Organosilica
membranes are a promising candidate for pervaporation
dehydration owing to their tunable molecular sieving characteristics
and excellent hydrothermal stability. Herein, we report a facile modification
using an atmospheric-pressure water vapor plasma to enhance the pervaporation
performance of organosilica membranes. The surface of methyl-terminated
organosilica membranes was treated by water vapor plasma to develop
an ultrathin separation active layer suitable for pervaporation dehydration.
The surface hydrophilicity was increased by water vapor plasma due
to oxidative decomposition of methyl groups to form silanol groups.
The plasma-modified layer had a thickness of several nanometers and
had a silica-like structure due to the condensation of silanol groups.
The plasma-modified organosilica membranes exhibited an improved molecular
sieving property owing to the formation of highly cross-linked siloxane
networks with a pore size of approximately 0.4 nm. The membranes also
exhibited an excellent permselectivity in the dehydration of alcohols
due to the nanometer-thick separation active layer with controlled
pore size and increased hydrophilicity. The plasma-modified membranes
showed high H2O permeance exceeding 10–6 mol m–2 s–1 Pa–1 with permeance ratios for H2O/EtOH and H2O/IPA
of 517–3050 and >10 000, respectively, in the dehydration
of 90 wt % aqueous solutions at 50 °C, which is among the highest
permselectivities for silica-based membranes. Furthermore, the plasma-modified
membranes displayed highly efficient dehydration performance for a
H2O/MeOH mixture. The H2O permeance and H2O/MeOH permeance ratio in the dehydration of a 90 wt % MeOH
aqueous solution at 50 °C were (2.3–3.0) × 10–6 mol m–2 s–1 Pa–1 and 31–143, respectively, which exceeded the
permeance-selectivity trade-off of conventional membranes including
polymeric, silica-based, and zeolite membranes. The results indicate
that the proposed plasma-assisted approach can enhance the pervaporation
performance of organosilica membranes via the modification
under atmospheric pressure and at room temperature
Effects of Calcination Condition on the Network Structure of Triethoxysilane (TRIES) and How Si–H Groups Influence Hydrophobicity Under Hydrothermal Conditions
Network
size control was evaluated for microporous membranes derived
from triethoxysilane (TRIES) that contains highly reactive Si–H
groups. It was possible to control the concentration of the Si–H
groups via the conditions of calcination (temperature, atmosphere).
Si–H groups remained within their network structure when the
TRIES membrane was calcined at 350 °C under a N2 atmosphere,
and had a loose network structure (H2 permeance: 5.40 ×
10–7 mol m–2 s–1 Pa–1, H2/CH4 selectivity:
36). When calcination at high temperatures converted the Si–H
groups to Si–O–Si groups, the TRIES membrane showed
a high level of separation performance (H2 permeance: 2.34
× 10–7 mol m–2 s–1 Pa–1, H2/CH4 selectivity:
590) due to a densification of the network structure. Compared with
conventional microporous silica membranes, a TRIES membrane with Si–H
groups showed hydrophobic properties, but water vapor was adsorbed
and/or capillary-condensed in the microporous structure, and permeation
blocking for He molecules was observed at temperatures below 150 °C
in the presence of saturated water vapor at 25 °C. Hydrophobic
Si–H groups improved the hydrothermal stability at 300 °C,
but depending on the partial pressure of the steam, the reaction between
Si–H groups and water vapor degraded the hydrothermal stability
of the TRIES membranes
Design of Silica Networks for Development of Highly Permeable Hydrogen Separation Membranes with Hydrothermal Stability
Design of Silica Networks for Development of Highly Permeable Hydrogen Separation Membranes with Hydrothermal Stabilit
Development of Robust Organosilica Membranes for Reverse Osmosis
Hybrid organically bridged silica membranes have attracted considerable attention because of their high performances in a variety of applications. Development of robust reverse osmosis (RO) membranes to withstand aggressive operating conditions is still a major challenge. Here, a new type of microporous organosilica membrane has been developed and applied in reverse osmosis. Sol–gel derived organosilica RO membranes reject isopropanol with rejection higher than 95%, demonstrating superior molecular sieving ability for neutral solutes of low molecular weight. Due to the introduction of an inherently stable hybrid network structure, the membrane withstands higher temperatures in comparison with commercial polyamide RO membranes, and is resistant to water to at least 90 °C with no obvious changes in filtration performance. Furthermore, both an accelerated chlorine-resistance test and Fourier transform infrared analysis confirm excellent chlorine stability in this material, which demonstrates promise for a new generation of chlorine-resistant RO membrane materials
Tailoring the Separation Behavior of Polymer-Supported Organosilica Layered-Hybrid Membranes via Facile Post-Treatment Using HCl and HN<sub>3</sub> Vapors
A promising layered-hybrid membrane
consisting of a microporous
organosilica active layer deposited onto a porous polymer support
was prepared via a facile sol–gel spin-coating process. Subsequently,
the pore sizes and structures of the organosilica top layers on the
membrane surface were tuned at mild temperature combined with vapor
treatment from either hydrochloric acid (HVT) or ammonia (AVT), thereby
tailoring the desalination performance of the membranes during reverse
osmosis (RO) processing. The effects of HVT and AVT on the pore size,
structure, and morphology of organosilica layers and on the separation
performances of membranes were investigated in detail. We confirmed
that both HVT and AVT processes accelerated the condensation of silanol
(SiOH) in the organosilica layer, which led to dense silica
networks. The layered-hybrid membranes after HVT showed an improved
salt rejection and reduced water flux, while membranes after AVT exhibited
a decrease in both salt rejection and water permeability. We found
that HVT gave rise to smoother and denser organosilica layers, while
AVT produced large voids and formed pinholes due to Ostwald ripening.
These conclusions were supported by a comparative analysis of the
results obtained via FTIR, TG-MS, SPM, and RO desalination
Physicochemical Treatments of Graphene Oxide to Improve Water Vapor/Gas Separation Performance of Supported Laminar Membranes: Sonication and H<sub>2</sub>O<sub>2</sub> Oxidation
We investigated the previously unexplored
domain of water vapor/gas
separation using graphene oxide (GO) membranes, expecting future applications,
including gas dehumidifiers and superior humidity controllers. While
the importance of manipulation of GO nanosheet size and surface chemistry
in traditional water purification and gas separation has been acknowledged,
their potential impact on water vapor/gas separation remained unexplored
until now. We applied sonication and hydrogen peroxide treatments
to GO water dispersions and systematically evaluated the size and
surface chemistry of each GO nanosheet. Both treatments reduced the
GO nanosheet size to shorten the diffusion length, which improved
water permeance. In addition, hydrogen peroxide treatment improved
the hydrophilicity of the nanosheet. Our novel findings demonstrate
that optimization of GO nanosheet size and the increase in their hydrophilicity
via hydrogen peroxide treatments for 5 h significantly enhance water
permeance, leading to a remarkable water vapor permeance of 4.6 ×
10–6 mol/(m2 s Pa) at 80 °C, a 3.1-fold
improvement over original GO membranes, while maintaining a water
vapor/nitrogen permeance ratio exceeding 10,000. These results not
only provide important insights into the nature of water vapor/gas
separation but also suggest innovative methods for optimizing the
GO membrane structure
Tailoring a Thermally Stable Amorphous SiOC Structure for the Separation of Large Molecules: The Effect of Calcination Temperature on SiOC Structures and Gas Permeation Properties
A SiOC
membrane with high oxidative stability for gas separation
was tailored by utilizing vinyltrimethoxysilane, triethoxysilane,
and 1,1,3,3-tetramethyldisiloxane as Si precursors. Amorphous SiOC
networks were formed via the condensation of Si–OH groups,
the hydrosilylation of Si–H and Si–CHCH<sub>2</sub> groups, and a crosslinking reaction of Si–CH<sub>3</sub> groups, respectively. The crosslinking of Si–CH<sub>3</sub> groups at temperatures ranging from 600 to 700 °C under a N<sub>2</sub> atmosphere was quite effective in constructing a Si–CH<sub>2</sub>–Si unit without the formation of mesopores, which
was confirmed by the results of N<sub>2</sub> adsorption and by the
gas permeation properties. The network pore size of the SiOC membrane
calcined at 700 °C under N<sub>2</sub> showed high oxidative
stability at 500 °C and was appropriate for the separation of
large molecules (H<sub>2</sub>/CF<sub>4</sub> selectivity: 640, H<sub>2</sub>/SF<sub>6</sub>: 2900, N<sub>2</sub>/CF<sub>4</sub>: 98).
A SiOC membrane calcined at 800 °C showed H<sub>2</sub>/N<sub>2</sub> selectivity of 62, which was approximately 10 times higher
than that calcined at 700 °C because the SiOC networks were densified
by the cleavage and redistribution reactions of Si–C and Si–O
groups
