413 research outputs found
Surprising temperature dependence of the dust particle growth rate in low pressure Ar/C2H2 plasmas
We have experimentally monitored the growth rate of dust particles in a low pressure Ar/C2H2 radiofrequency discharge as a function of the gas temperature Tg and independent of the C2H radical density and the gas density. Used diagnostics are laser light scattering and measurements of the phase angle between the RF voltage and current. In contrast to most literature, we demonstrate that the growth rate is not a monotonically decreasing function of Tg but shows a maximum around Tg¿=¿65¿°C. In addition, we demonstrate that the phase angle is an accurate measure to monitor the particle growth rat
Method of treating surfaces of substrates with the aid of a plasma and a reactor for carrying out the method
A method for treating substrate surfaces (e.g. etching and deposition) using a plasma. In practice the plasma flows from its source (13) to a treatment chamber (3). The plasma source is first flushed through with a flushing gas and when this has passed the cathodes (6), the reactant gas is fed into the plasma generator. The reactor used in this process is also described
Method of treating surfaces of substrates with the aid of a plasma
A method for treating substrate surfaces (e.g. etching and deposition) using a plasma. In practice the plasma flows from its source (13) to a treatment chamber (3). The plasma source is first flushed through with a flushing gas and when this has passed the cathodes (6), the reactant gas is fed into the plasma generator. The reactor used in this process is also described
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