5 research outputs found
Ultrafast and Low Temperature Synthesis of Highly Crystalline and Patternable Few-Layers Tungsten Diselenide by Laser Irradiation Assisted Selenization Process
Recently, a few attempts to synthesize monolayers of transition metal dichalcogenides (TMDs) using the chemical vapor deposition (CVD) process had been demonstrated. However, the development of alternative processes to synthesize TMDs is an important step because of the time-consuming, required transfer and low thermal efficiency of the CVD process. Here, we demonstrate a method to achieve few-layers WSe<sub>2</sub> on an insulator <i>via</i> laser irradiation assisted selenization (LIAS) process directly, for which the amorphous WO<sub>3</sub> film undergoes a reduction process in the presence of selenium gaseous vapors to form WSe<sub>2</sub>, utilizing laser annealing as a heating source. Detailed growth parameters such as laser power and laser irradiation time were investigated. In addition, microstructures, optical and electrical properties were investigated. Furthermore, a patternable WSe<sub>2</sub> concept was demonstrated by patterning the WO<sub>3</sub> film followed by the laser irradiation. By combining the patternable process, the transfer-free WSe<sub>2</sub> back gate field effect transistor (FET) devices are realized on 300 nm-thick SiO<sub>2</sub>/P<sup>+</sup>Si substrate with extracted field effect mobility of ∼0.2 cm<sup>2</sup> V<sup>–1</sup> s<sup>–1</sup>. Similarly, the reduction process by the laser irradiation can be also applied for the synthesis of other TMDs such as MoSe<sub>2</sub> from other metal oxides such as MO<sub>3</sub> film, suggesting that the process can be further extended to other TMDs. The method ensures one-step process to fabricate patternable TMDs, highlighting the uniqueness of the laser irradiation for the synthesis of different TMDs
Hyperacmosins H-J, three new polycyclic polyprenylated acylphloroglucinol derivatives from <i>Hypericum acmosepalum</i>
Three new polycyclic polyprenylated acylphloroglucinol derivatives, hyperacmosins H-J (1–3), with four known compounds (4–7), were isolated from the air-dried aerial parts of Hypericum acmosepalum. Especially, compounds 1 and 2 were identified as methylated polycyclic polyprenylated acylphloroglucinol derivatives (mPPAPs). Their structures were established by NMR, HRESIMS and experimental electronic circular dichroism (ECD) spectra. The hepatoprotective activity of seven compounds were evaluated. Compounds 1 and 5 exhibited hepatoprotective activity against paracetamol-induced HepG2 cell damage. </p
Direct Synthesis of Graphene with Tunable Work Function on Insulators via In Situ Boron Doping by Nickel-Assisted Growth
Work
function engineering, a precise tuning of the work function, is essential
to achieve devices with the best performance. In this study, we demonstrate
a simple technique to deposit graphene on insulators with in situ
controlled boron doping to tune the work function. At a temperature
higher than 1000 °C, the boron atoms substitute carbon sites
in the graphene lattice with neighboring carbon atoms, leading to
the graphene with a p-type doping behavior. Interestingly, the involvement
of boron vapor into the system can effectively accelerate the reaction
between nickel vapor and methane, achieving a fast graphene deposition.
The changes in surface potential and work function at different doping
levels were verified by Kelvin probe force microscopy, for which the
work function at different doping levels was shifted between 20 and
180 meV. Finally, the transport mechanism followed by the Mott variable-range
hopping model was found due to the strong disorder nature of the system
with localized charge-carrier states
Transfer-Free Growth of Atomically Thin Transition Metal Disulfides Using a Solution Precursor by a Laser Irradiation Process and Their Application in Low-Power Photodetectors
Although chemical vapor deposition is the most common
method to synthesize transition metal dichalcogenides (TMDs), several
obstacles, such as the high annealing temperature restricting the
substrates used in the process and the required transfer causing the
formation of wrinkles and defects, must be resolved. Here, we present
a novel method to grow patternable two-dimensional (2D) transition
metal disulfides (MS<sub>2</sub>) directly underneath a protective
coating layer by spin-coating a liquid chalcogen precursor onto the
transition metal oxide layer, followed by a laser irradiation annealing
process. Two metal sulfides, molybdenum disulfide (MoS<sub>2</sub>) and tungsten disulfide (WS<sub>2</sub>), are investigated in this
work. Material characterization reveals the diffusion of sulfur into
the oxide layer prior to the formation of the MS<sub>2</sub>. By controlling
the sulfur diffusion, we are able to synthesize continuous MS<sub>2</sub> layers beneath the top oxide layer, creating a protective
coating layer for the newly formed TMD. Air-stable and low-power photosensing
devices fabricated on the synthesized 2D WS<sub>2</sub> without the
need for a further transfer process demonstrate the potential applicability
of TMDs generated via a laser irradiation process
Wafer-Scale Growth of WSe<sub>2</sub> Monolayers Toward Phase-Engineered Hybrid WO<sub><i>x</i></sub>/WSe<sub>2</sub> Films with Sub-ppb NO<sub><i>x</i></sub> Gas Sensing by a Low-Temperature Plasma-Assisted Selenization Process
An
inductively coupled plasma (ICP) process was used to synthesize
transition metal dichalcogenides (TMDs) through a plasma-assisted
selenization process of metal oxide (MO<sub><i>x</i></sub>) at a temperature as low as 250 °C. In comparison with other
CVD processes, the use of ICP facilitates the decomposition of the
precursors at low temperatures. Therefore, the temperature required
for the formation of TMDs can be drastically reduced. WSe<sub>2</sub> was chosen as a model material system due to its technological importance
as a p-type inorganic semiconductor with an excellent hole mobility.
Large-area synthesis of WSe<sub>2</sub> on polyimide (30 × 40
cm<sup>2</sup>) flexible substrates and 8 in. silicon wafers with
good uniformity was demonstrated at the formation temperature of 250
°C confirmed by Raman and X-ray photoelectron (XPS) spectroscopy.
Furthermore, by controlling different H<sub>2</sub>/N<sub>2</sub> ratios,
hybrid WO<sub><i>x</i></sub>/WSe<sub>2</sub> films can be
formed at the formation temperature of 250 °C confirmed by TEM
and XPS. Remarkably, hybrid films composed of partially reduced WO<sub><i>x</i></sub> and small domains of WSe<sub>2</sub> with
a thickness of ∼5 nm show a sensitivity of 20% at 25 ppb at
room temperature, and an estimated detection limit of 0.3 ppb with
a <i>S</i>/<i>N</i> > 10 for the potential
development
of a low-cost plastic/wearable sensor with high sensitivity