9 research outputs found

    Copper Nanofilament Formation during Unipolar Resistance Switching of Electrodeposited Cuprous Oxide

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    An emerging nonvolatile, solid-state memory is resistance random access memory (RRAM). RRAM is based on reversible switching of resistance in semiconductor and insulator thin films. Here, unipolar resistance switching is demonstrated in electrodeposited films of [111]-textured cuprous oxide (Cu<sub>2</sub>O). The textured Cu<sub>2</sub>O is electrodeposited from a highly alkaline bath using tartrate as the complexing agent. The switching is observed in a cell composed of a film of Cu<sub>2</sub>O sandwiched between Au and Au–Pd contacts. The switching is attributed to the formation and rupture of a Cu nanofilament in the Cu<sub>2</sub>O. The initial resistance of the cell is 6.5 × 10<sup>6</sup> Ω, and a conducting filament is formed in the film by scanning the applied electric field to 6.8 × 10<sup>6</sup> V m<sup>–1</sup>. The cell is then reversibly cycled between a low resistance state of 16.6 Ω and a high resistance state of 4 × 10<sup>5</sup> Ω by the SET and RESET processes. In the low resistance state, the resistance decreases linearly with decreasing temperature, consistent with metallic behavior. The resistance temperature coefficient of 1.57 × 10<sup>–3</sup> K<sup>–1</sup> is similar to that of nanoscale metallic Cu. Current–voltage (<i>I</i>–<i>V</i>) data suggests that applying a higher compliance current increases the filament size during the FORMING and the SET process and also causes a higher RESET current. The filament diameter varies from 50 to 147 nm for compliance currents ranging from 10 to 100 mA. At high electric field in the as-deposited state, the conduction behavior follows Poole-Frenkel emission. The filament temperature is estimated from the nonohmic behavior of the cell in the RESET step. The calculated temperature of 798 K before rupture of the Cu filament suggests Joule heating of the filament, resulting in melting, sintering, or thermal oxidation of the Cu filament

    Electrodeposition of Epitaxial Lead Iodide and Conversion to Textured Methylammonium Lead Iodide Perovskite

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    Applications for lead iodide, such as lasing, luminescence, radiation detection, and as a precursor for methylammonium lead iodide perovskite photovoltaic cells, require highly ordered crystalline thin films. Here, an electrochemical synthesis route is introduced that yields textured and epitaxial films of lead iodide at room temperature by reducing molecular iodine to iodide ions in the presence of lead ions. Lead iodide grows with a [0001] fiber texture on polycrystalline substrates such as fluorine-doped tin oxide. On single-crystal Au(100), Au(111), and Au(110) the out-of-plane orientation of lead iodide is also [0001], but the in-plane orientation is controlled by the single-crystal substrate. The epitaxial lead iodide on single-crystal gold is converted to textured methylammonium lead iodide perovskite with a preferred [110] orientation via methylammonium iodide vapor-assisted chemical transformation of the solid

    Synthesis of Superconducting Nanocables of FeSe Encapsulated in Carbonaceous Shell

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    The recent discovery of superconductivity in iron selenide has attracted considerable attention due to the simplicity of composition, unconventional nature of superconductivity, and ease of synthesis. We have synthesized superconducting FeSe nanowires with a simple catalyst-aided vapor transport reaction at 800 °C in an inert atmosphere. The precursors were chosen to be elemental Se and iron acetylacetonate [Fe<sup>III</sup>(C<sub>5</sub>H<sub>8</sub>O<sub>2</sub>)<sub>3</sub>]. These vaporized very easily, thereby facilitating transport, and also contributed to the formation of a carbonaceous shell encapsulating the FeSe nanowires. The superconductivity of these nanocables was confirmed through magnetic measurements and a <i>T</i><sub>c</sub> of ≈8 K was obtained for an ensemble of nanocables. The length of FeSe filling inside the carbon nanofibers could be varied by controlling the reaction conditions while the diameter of nanowires was dependent on the thickness of Au–Pd coating used as a catalyst. Extensive analysis through high-resolution microscopy revealed that there was considerable lattice contraction of FeSe in the nanocable up to about 3.6% along the <i>c</i>-direction leading to a reduced spacing between the (001) lattice planes. Interestingly, this compression was more pronounced near the catalyst-FeSe interface and was reduced further along the length of the nanocable. The presence of carbon nanofibers as a shell around the FeSe protected the FeSe nanowires from both atmospheric O<sub>2</sub> and moisture attack, as was evident from the very long ambient condition shelf life of these nanocables, and also makes them more stable under e-beam irradiation

    Superconducting Filaments Formed During Nonvolatile Resistance Switching in Electrodeposited δ‑Bi<sub>2</sub>O<sub>3</sub>

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    We show that electrodeposited films of δ-Bi<sub>2</sub>O<sub>3</sub> in a Pt/δ-Bi<sub>2</sub>O<sub>3</sub>/Au cell exhibit unipolar resistance switching. After being formed at a large electric field of 40 MV/m, the cell can be reversibly switched between a low resistance state (156 Ω) and a high resistance state (1.2 GΩ) by simply cycling between SET and RESET voltages of the same polarity. Because the high and low resistance states are persistent, the cell is a candidate for nonvolatile resistance random access memory (RRAM). A Bi nanofilament forms at the SET voltage, and it ruptures to form a 50 nm gap during the RESET step at a current density of 2 × 10<sup>7</sup> A/cm<sup>2</sup>. The diameter of the Bi filament is a function of the compliance current, and can be tuned from 140 to 260 nm, but the current density in the RESET step is independent of the Bi diameter. An electromigration rupture mechanism is proposed. The Bi nanofilaments in the low resistance state are superconducting, with a <i>T</i><sub>c</sub> of 5.8 K and an <i>H</i><sub>c</sub> of 5 kOe. This is an unexpected result, because bulk Bi is not a superconductor

    Room-Temperature Electrochemical Reduction of Epitaxial Magnetite Films to Epitaxial Iron Films

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    The electrochemical reduction of oxides to metals has been studied for decades. Earlier work produced polycrystalline bulk metals. Here, we report that pre-electrodeposited epitaxial face-centered cubic magnetite thin films can be electrochemically reduced to epitaxial body-centered cubic iron thin films in aqueous solution on single-crystalline gold substrates at room temperature. This technique opens new possibilities to produce special epitaxial metal/metal oxide heterojunctions and a wide range of epitaxial metallic alloy films from the corresponding mixed metal oxides

    Electrochemical Synthesis and Nonvolatile Resistance Switching of Mn<sub>3</sub>O<sub>4</sub> Thin Films

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    An electrodeposition method is introduced to produce crystalline films of Mn<sub>3</sub>O<sub>4</sub> from aqueous solution. The films are electrodeposited potentiostatically from a solution of 0.2 M Mn­(II) acetate at a pH of 6 and a deposition temperature of 80 °C. The anodic deposition is performed in the potential range of 0.275–0.350 V vs Ag/AgCl/KCl­(sat.). In this potential range the current efficiency is 100%. Both the stoichiometry and the morphology of the films can be controlled through the applied potential. Films deposited at a low overpotential grow with a [001] preferred orientation, columnar microstructure, and near-stoichiometric Mn­(III)/Mn­(II) ratio of 1.99. Films deposited at higher overpotential deposit with a near-random orientation, porous or powdery microstructure, and Mn­(III)/Mn­(II) ratio of 2.62. At potentials greater than 0.38 V, amorphous films of MnO<sub>2</sub> are produced. The as-deposited Mn<sub>3</sub>O<sub>4</sub> has a very high resistivity of 4.4 × 10<sup>8</sup> Ωcm. The electrodeposited Mn<sub>3</sub>O<sub>4</sub> films undergo unipolar, nonvolatile resistance switching. An Au/Mn<sub>3</sub>O<sub>4</sub>/AuPd cell can be reversibly switched between a high resistance state (30 MΩ) and a low resistance state (14.8 Ω) by applying SET and RESET voltages of the same polarity. SET and RESET times of approximately 2 and 50 ns were observed. Because of the large resistance contrast between the two states and the persistence of each state, Mn<sub>3</sub>O<sub>4</sub> is a candidate for future resistive random access memory (RRAM) devices

    Electrodeposited Germanium Nanowires

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    Germanium (Ge) is a group IV semiconductor with superior electronic properties compared with silicon, such as larger carrier mobilities and smaller effective masses. It is also a candidate anode material for lithium-ion batteries. Here, a simple, one-step method is introduced to electrodeposit dense arrays of Ge nanowires onto indium tin oxide (ITO) substrates from aqueous solution. The electrochemical reduction of ITO produces In nanoparticles that act as a reduction site for aqueous Ge(IV) species, and as a solvent for the crystallization of Ge nanowires. Nanowires deposited at 95 °C have an average diameter of 100 nm, whereas those deposited at room temperature have an average diameter of 35 nm. Both optical absorption and Raman spectroscopy suggest that the electrodeposited Ge is degenerate. The material has an indirect bandgap of 0.90–0.92 eV, compared with a value of 0.67 eV for bulk, intrinsic Ge. The blue shift is attributed to the Moss–Burstein effect, because the material is a p-type degenerate semiconductor. On the basis of the magnitude of the blue shift, the hole concentration is estimated to be 8 × 10<sup>19</sup> cm<sup>–3</sup>. This corresponds to an In impurity concentration of about 0.2 atom %. The resistivity of the wires is estimated to be 4 × 10<sup>–5</sup> Ω·cm. The high conductivity of the wires should make them ideal for lithium-ion battery applications

    Electrodeposition of Co<sub><i>x</i></sub>Fe<sub>3–<i>x</i></sub>O<sub>4</sub> Epitaxial Films and Superlattices

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    Spinel ferrites are of interest because of their potential applications in spintronics (spin-based electronics) and solid-state memories. Cobalt ferrite (CoFe<sub>2</sub>O<sub>4</sub>) is an inverse spinel ferrite. Currently, the utility of CoFe<sub>2</sub>O<sub>4</sub> is mainly based on its high coercivity and magnetocrystalline anisotropy. The magnetic and electrical properties of CoFe<sub>2</sub>O<sub>4</sub> depend on its Co:Fe ratio. In this paper, a one-step electrodeposition of Co<sub><i>x</i></sub>Fe<sub>3‑x</sub>O<sub>4</sub> (0 < <i>x</i> < 1) thin films from an alkaline Fe<sup>3+</sup>- and Co<sup>2+</sup>-triethanolamine solution is presented. The Co:Fe ratio in the Co<sub><i>x</i></sub>Fe<sub>3–<i>x</i></sub>O<sub>4</sub> thin films can be tuned by controlling the deposition potential. That is, Co<sub><i>x</i></sub>Fe<sub>3–<i>x</i></sub>O<sub>4</sub> thin films with tunable chemical and physical properties can be produced from a single solution. Superlattices in the Co<sub><i>x</i></sub>Fe<sub>3–<i>x</i></sub>O<sub>4</sub> system were also electrodeposited from the same solution by simply pulsing between two potentials. Compared to Co<sub><i>x</i></sub>Fe<sub>3–<i>x</i></sub>O<sub>4</sub> individual films, superlattices exhibit resistance switching and a more pronounced negative differential resistance (NDR) feature at lower current during perpendicular transport measurements, which could be used in resistive random access memories
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