3 research outputs found
A Generic Hybrid Model for Bulk Elastodynamics, With Application to Ultrasonic Nondestructive Evaluation
Monolayer
two-dimensional transitional metal dichalcogenides, such as MoS<sub>2</sub>, WS<sub>2</sub>, and WSe<sub>2</sub>, are direct band gap
semiconductors with large exciton binding energy. They attract growing
attentions for optoelectronic applications including solar cells,
photodetectors, light-emitting diodes and phototransistors, capacitive
energy storage, photodynamic cancer therapy, and sensing on flexible
platforms. While light-induced luminescence has been widely studied,
luminescence induced by injection of free electrons could promise
another important applications of these new materials. However, cathodoluminescence
is inefficient due to the low cross-section of the electron–hole
creating process in the monolayers. Here for the first time we show
that cathodoluminescence of monolayer chalcogenide semiconductors
can be evidently observed in a van der Waals heterostructure when
the monolayer semiconductor is sandwiched between layers of hexagonal
boron nitride (hBN) with higher energy gap. The emission intensity
shows a strong dependence on the thicknesses of surrounding layers
and the enhancement factor is more than 500-fold. Strain-induced exciton
peak shift in the suspended heterostructure is also investigated by
the cathodoluminescence spectroscopy. Our results demonstrate that
MoS<sub>2</sub>, WS<sub>2</sub>, and WSe<sub>2</sub> could be promising
cathodoluminescent materials for applications in single-photon emitters,
high-energy particle detectors, transmission electron microscope displays,
surface-conduction electron-emitter, and field emission display technologies
Controlled Synthesis of High-Quality Monolayered α‑In<sub>2</sub>Se<sub>3</sub> via Physical Vapor Deposition
In this work, we have demonstrated
the synthesis of high-quality monolayered α-In<sub>2</sub>Se<sub>3</sub> using physical vapor deposition method under atmospheric
pressure. The quality of the In<sub>2</sub>Se<sub>3</sub> atomic layers
has been confirmed by complementary characterization technologies
such as Raman/photoluminescence spectroscopies and atomic force microscope.
The atomically resolved images have been obtained by the annular dark-field
scanning transmission electron microscope. The field-effect transistors
have been fabricated using the atomically layered In<sub>2</sub>Se<sub>3</sub> and exhibit p-type semiconducting behaviors with the mobility
up to 2.5 cm<sup>2</sup>/ Vs. The In<sub>2</sub>Se<sub>3</sub> layers
also show a good photoresponsivity of 340A/W, as well as 6 ms response
time for the rise and 12 ms for the fall. These results make In<sub>2</sub>Se<sub>3</sub> atomic layers a promising candidate for the
optoelectronic and photosensitive device applications
One-Step Synthesis of Metal/Semiconductor Heterostructure NbS<sub>2</sub>/MoS<sub>2</sub>
Chemical
vapor deposition (CVD) has proven its surpassing advantages,
such as larger scale, interlayer orientation control, and clean interface,
in the synthesis of transitional metal dichalcogenide (TMDC) semiconductor/semiconductor
van der Waals (vdW) heterostructures. However, it is suffering problems
of high melting points and low chemical reactivity of metal oxide
feedstocks in the preparation of high-quality metal/semiconductor
(M/S) TMDC vdW heterostructures. Here, for the first time, we report
the synthesis of the M/S TMDC vdW heterostructure NbS<sub>2</sub>/MoS<sub>2</sub> via a one-step halide-assisted CVD method, which effectively
overcomes the drawbacks of metal oxide precursors. This one-step method
provides the high quality and clean interface of the NbS<sub>2</sub>/MoS<sub>2</sub> heterostructure, which has been proved by the transmission
electron microscopy characterization. A mechanism that MoS<sub>2</sub> finishes the growth first and subsequently serves as a superior
substrate for the growth of NbS<sub>2</sub> is proposed. This novel
method will open up new opportunities in the syntheses of other M/S
TMDC vdW heterostructures and will facilitate the research of the
TMDC M/S interface