Skip to main content
Article thumbnail
Location of Repository

Modeling evaporation, ion-beam assist, and magnetron sputtering of TiO 2 thin films over realistic timescales

By Sabrina Blackwell, Roger Smith, Steven D. Kenny, Louis J. Vernon and Michael Walls

Abstract

This article was published in the Journal of Materials Research [© Materials Research Society] and the definitive version is available at: http://dx.doi.org/10.1557/jmr.2011.380Results are presented for modeling the growth of TiO2 on the rutile (110) surface. We illustrate\ud how long time scale dynamics techniques can be used to model thin film growth at realistic growth\ud rates. The system evolution between deposition events is achieved through an on-the-fly Kinetic\ud Monte Carlo method, which finds diffusion pathways and barriers without prior knowledge of\ud transitions. We examine effects of various experimental parameters, such as substrate bias, plasma\ud density, and stoichiometry of the deposited species. Growth of TiO2 via three deposition methods\ud has been investigated: evaporation (thermal and electron beam), ion-beam assist, and reactive\ud magnetron sputtering. We conclude that the evaporation process produces a void filled, incomplete\ud structure even with the low-energy ion-beam assist, but that the sputtering process produces\ud crystalline growth. The energy of the deposition method plays an important role in the film quality

Publisher: © Materials Research Society
Year: 2012
DOI identifier: 10.1557/jmr.2011.380
OAI identifier: oai:dspace.lboro.ac.uk:2134/11615
Journal:

Suggested articles


To submit an update or takedown request for this paper, please submit an Update/Correction/Removal Request.