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Controlling the shape of the ion energy distribution at constant ion flux and constant mean ion energy with tailored voltage waveforms

By Bastien Bruneau, Trevor Lafleur, Jean-Paul Booth and Erik Johnson


International audienceIn this paper, we investigate the excitation of a capacitively coupled plasma using a non-sinusoidal voltage waveform whose amplitude- and slope-asymmetry varies continuously with a period which is a multiple of the fundamental RF period. We call this period the ?beating? period. Through particle-in-cell (PIC) simulations, we show that such waveforms cause oscillation of the self-bias at this beating frequency, corresponding to the charging and discharging of the external capacitor. The amplitude of this self-bias oscillation depends on the beating period, the value of the external capacitor, and the ion flux to the electrodes. This self-bias oscillation causes temporal modulation of the ion flux distribution function (IFDF), albeit at a constant ion flux and constant mean ion energy, and allows the energy width of the IFDF (averaged over the beating period) to be varied in a controlled fashion

Topics: [PHYS.PHYS.PHYS-PLASM-PH]Physics [physics]/Physics [physics]/Plasma Physics [physics.plasm-ph]
Publisher: 'IOP Publishing'
Year: 2016
DOI identifier: 10.1088/0963-0252/25/2/025006
OAI identifier: oai:HAL:hal-01549334v1
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