A magnetic semiconductor/metal nanocomposite with a nanostructured silicon wafer as base material and incorporated metallic nanostructures (Ni, Co, NiCo) is fabricated in two electrochemical steps. First, the silicon template is anodized in an HF-electrolyte to obtain a porous structure with oriented pores grown perpendicular to the surface. This etching procedure is carried out either in forming a sample with a single porous layer on one side or in producing a double-sided specimen with a porous layer on each side. Second, this matrix is used for deposition of transition metals as Ni, Co or an alloy of these. The achieved hybrid material with incorporated Ni- and Co-nanostructures within one sample is investigated magnetically. The obtained results are compared with the ones gained from samples containing a single metal
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