Skip to main content
Article thumbnail
Location of Repository

Experimental studies of the processes occuring in ion plating discharges

By H Valizadeh

Abstract

A theoretical study of the processes occurring in ion plating is carried out and the potential of various mechanisms affecting properties of ion-plated films is studied. Three pieces of apparatus are designed and developed to study the contributions of the mechanisms responsible for the properties of ionplated films.\ud A thorough experimental investigation of the processes occurring in ion plating discharges is carried out

Topics: TK, other
OAI identifier: oai:usir.salford.ac.uk:2065

Suggested articles

Citations

  1. (ARE-UNITS)
  2. (1464). 7'- doi
  3. arge Peak High I voltage Pressure L%)Orqy L . e. r c.. y rr V) (CV)
  4. (1973). Film-Substrate Adhesion of Comparison of d Films produc! under
  5. In terms of Davis and Vanderslice's theory which predicts a preponderance of low energy ions and hence high energy neutrals it is, in fact, to be expected that the uniform field assumption will tend to move the loxoo YIELD [
  6. (1968). Ion Bombardment of Surfaces, doi
  7. (1970). Studies of Decaying Plasmas,

To submit an update or takedown request for this paper, please submit an Update/Correction/Removal Request.