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In-situ study of SAMs growth process by cross analysis of AFM height and lateral deflection

By Chun-Lung Wu


[[abstract]]This paper introduces a novel way to investigate SAMs growth process by cross analysis of the information of AFM height and lateral deflection scanning results. The traditional ways by analysis of AFM height and histogram data can not differentiate the molecular growth detail behavior of alkylsinae SAMs because the images captured by AFM are static and lack molecular level information. Thus, this paper proposes to employ the standard deviation of AFM data to analyze the in-situ growth behaviors of alkylsinae SAMs in comparison with the local height and lateral deflection data. The analysis results demonstrated close correlation of the SAMs growth process among the aforementioned data analysis methods[[fileno]]2060118030009[[department]]工程與系統科學

Topics: atomic force microscopy, monolayers, organic compounds, self-assembly, [[classification]]22
Publisher: Nano Science and Technology Institute
Year: 2010
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