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Reactive pulse magnetron sputtering for deposition of piezoelectric AlN layers

By D. Glöß, H. Bartzsch, M. Gittner, P. Frach, T. Herzog, S. Walter and H. Heuer
Year: 2012
OAI identifier: oai:fraunhofer.de:N-216932
Provided by: Fraunhofer-ePrints
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