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High rate deposition of amorphous hydrogenated carbon films by hollow cathode arc PECVD

By Burkhard Zimmermann, Fred Fietzke, Heidrun Klostermann, Jan Lehmann, Frans Munnik and Wolfhard Möller

Abstract

The potential of a magnetically enhanced hollow cathode arc source for high rate PECVD processes has been evaluated for amorphous hydrogenated carbon film (a-C:H) deposition from acetylene precursor gas. The argon-acetylene plasma has been characterized by energy-resolved mass spectrometry revealing a large variety of dissociation and polymerization products as well as their kinetic energy distributions, which are related to the spatial distribution of ion generation. a-C:H layers have been deposited on flat substrates with rates of up to 1 µm/min. Depending on the deposition conditions, polymeric, graphitic, and diamond-like carbon films with a maximum nanoindentation hardness of 18.2 GPa have been produced and analyzed by Raman spectroscopy, scanning electron microscopy, elastic recoil detection analysis and Rutherford backscattering spectrometry

Topics: hollow cathode arc, plasma diagnostic, amorphous hydrogenated carbon, diamond-like carbon, plasma-enhanced chemical vapour deposition, elastic recoil detection analysis
Year: 2012
DOI identifier: 10.1016/j.surfcoat.2012.09.020
OAI identifier: oai:fraunhofer.de:N-219563
Provided by: Fraunhofer-ePrints
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