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Analysis of the gate current as a suitable indicator for FET degradation under nonlinear dynamic regime

By A. Raffo, S. Di Falco, G. Sozzi, R. Menozzi, D. Schreurs and G. Vannini

Abstract

Electron device degradation, although not directly accounted for, represents a key issue in microwave circuit design. This is especially true when the particular applications involved (e.g., satellite, military, consumer) do not allow or strongly discourage any kind of maintenance. As a matter of fact, in order to account for device degradation in circuit design, a suitable electron device model is needed which is able to predict the performance degradation as a function of the actual electrical regime involved in the device operation. Such a kind of model is not available in literature. In this paper, quantitative results are provided for device degradation indicators which correlate DC and RF stress experiments. These results can be considered an important step toward the definition of a nonlinear model accounting for device degradation

Year: 2011
DOI identifier: 10.1016/j.microrel.2010.08.010
OAI identifier: oai:iris.unife.it:11392/1409646
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