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Very high two-dimensional hole gas mobilities in strained silicon germanium

By Engin Basaran, Richard A. A. Kubiak, Terry E. Whall and Evan H. C. Parker

Abstract

We report on the growth by solid source MBE and characterization of remote doped Si/SiGe/Si two-dimensional hole gas structures. It has been found that by reducing the Ge composition to <=13% and limiting the thickness of the alloy layer, growth temperatures can be increased up to 950 °C for these structures while maintaining good structural integrity and planar interfaces. Record mobilities of 19 820 cm2 V−1 s−1 at 7 K were obtained in normal structures. Our calculations suggest that alloy scattering is not important in these structures and that interface roughness and interface charge scattering limit the low temperature mobilities

Topics: TK, QC
Publisher: American Institute of Physics
Year: 1994
OAI identifier: oai:wrap.warwick.ac.uk:1034

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