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Corrosion layers removal in low-pressure plasma

By Adam Kujawa

Abstract

A plasmachemical reduction of corrosion layers on copper was studied. In this case two series of copper samples were prepared and putted in two corrosive environments for one week. The first corrosive environment contained a concentrated nitric acid and the second environment contained a concentrated sulfuric acid. Samples thus prepared were ready to be plasmachemicaly treated. The plasmachemical reductions took place in low-temperature, low-pressure, non-isothermal, high-frequency-inducted hydrogen plasma on the Faculty of Chemistry in University of Technology in Brno. The discharge was generated in continual or pulse mode with changeable pulse ratio. To monitor the reduction process an optical emission spectroscopy was used. The radiation from plasma discharge was measured by an optical spectrometer in the intervals of 1 to 10 minutes. An object of our concern in collected spectrum was the radiation of OH radicals with electromagnetical wavelenght in a range of 305 – 330 nm, and which were produced in a reaction between the hydrogen radicals and the oxygen atoms, contained in the corosion layers. A rotation temperature of plasma was calculated from the spectrums of OH radicals in a dependence of discharge conditions. Gathered findings will give us a better knowing of this conservation technique, that is used for treatment of the corroded surfaces of the archeological artifacts, and will also allow more provident appliance of this method on a copper historical objects

Topics: copper; corrosion; plazma; optical emission spectroscopy; plasma; koroze; optická emisní spektroskopie; měď
Publisher: Vysoké učení technické v Brně. Fakulta chemická
Year: 2011
OAI identifier: oai:invenio.nusl.cz:211930
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