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Nanostructured Alumina Films by E-beams Evaporation

By IN Reddy, N Sridhara, Parthasarathi Bera, C Anandan, AK Sharma and Arjun Dey

Abstract

Deposition of alumina thin films with different thicknesses e.g. 90, 120 and 150 nm on titanium (Ti) thin foils was carried out by electron-beam evaporation technique at room temperature. As-grown films were annealed at 500, 700 and 800 °C in air. Further, phase, morphology and electronic structure of the as-grown and annealed thin films were investigated by X-ray diffraction (XRD), field emission scanning electron microscopy (FESEM) and X-ray photoelectron spectroscopy (XPS) techniques, respectively. As-grown thin films are amorphous while the annealed thin films show crystalline peaks of different mixed phases of alumina as revealed by XRD. In addition, FESEM studies demonstrate different nanostructures e.g. fish-bone-like and nanorods in the thin films annealed at 700 and 800 °C, respectively

Topics: Aeronautics (General)
Publisher: 'Elsevier BV'
Year: 2015
DOI identifier: 10.1016/j.ceramint.2015.04.147
OAI identifier: oai:nal-ir.nal.res.in:12465
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