Behaviour of nickel on monoatomic-pure surfaces of silicon and structures, induced by them

Abstract

Pure and nickel containing surfaces of silicon (111), (110), (100) and deviated on 8 degrees from (111) are considered in the paper aiming at the investigation of the nickel diffusion on various surfaces of silicon and the nickel influence on the structure of silicon surfaces. As a result the fact of the preferable transfer of nickel on the silicon volume during annealing has been established. The observed processes on surfaces, containing nickel, have been explained. New surface structures and surface phase transitions have been described. Numerical parameters of the nickel transfer process along a surface have been obtained as well as the correlation between surface structures and the surface concentration of nickelAvailable from VNTIC / VNTIC - Scientific & Technical Information Centre of RussiaSIGLERURussian Federatio