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Preparation de couches minces d'oxynitrure de silicium par PECVD en vue de greffage chimique Application a un ISFET pH

By 69 - Ecully (France) Ecole Centrale Lyonnaise, 69 - Ecully (France). Lab. de Physico-Chimie des Interfaces Ecole Centrale de Lyon, 75 - Paris (France) Ministere de la Recherche et de la Technologie (MRT), 69 - Villeurbanne (France) Societe Lyonnaise d'Electronique Appliquee, 38 - Grenoble (France) Centre National de la Recherche Scientifique (CNRS) and 38 - Grenoble (France). Lab. d'Etudes des Proprietes Electroniques des Solides Centre National de la Recherche Scientifique (CNRS)

Abstract

SIGLEAvailable at INIST (FR), Document Supply Service, under shelf-number : AR 14099 / INIST-CNRS - Institut de l'Information Scientifique et TechniqueFRFranc

Topics: 07D - Physical chemistry
Year: 1991
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Provided by: OpenGrey Repository
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