Skip to main content
Article thumbnail
Location of Repository

Anisotropic etching of crystalline silicon in alkaline solutions. Pt. 2 Influence of dopants

By Muenchen (Germany)) H. (Messerschmitt-Boelkow-Blohm G.m.b.H. (MBB) Seidel, H. (Berlin Freie Univ. (Germany). Inst. fuer Physikalische Chemie) Baumgaertel, Berlin (Germany)) A. (Fraunhofer-Institut fuer Mikrostrukturtechnik (IMT) Heuberger, Muenchen (Germany)) L. (Fraunhofer-Institut fuer Festkoerpertechnologie (IFT) Csepregi and Ottobrunn (Germany). Information und Dokumentation Messerschmitt-Boelkow-Blohm G.m.b.H. (MBB)

Abstract

SIGLECopy held by FIZ Karlsruhe; available from UB/TIB Hannover / FIZ - Fachinformationszzentrum Karlsruhe / TIB - Technische InformationsbibliothekDEGerman

Topics: 07D - Physical chemistry
Year: 1989
OAI identifier:
Provided by: OpenGrey Repository
Download PDF:
Sorry, we are unable to provide the full text but you may find it at the following location(s):
  • http://hdl.handle.net/10068/24... (external link)
  • Suggested articles


    To submit an update or takedown request for this paper, please submit an Update/Correction/Removal Request.