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Anisotropic etching of crystalline silicon in alkaline solutions. Pt. 2 Influence of dopants

By Muenchen (Germany)) H. (Messerschmitt-Boelkow-Blohm G.m.b.H. (MBB) Seidel, H. (Berlin Freie Univ. (Germany). Inst. fuer Physikalische Chemie) Baumgaertel, Berlin (Germany)) A. (Fraunhofer-Institut fuer Mikrostrukturtechnik (IMT) Heuberger, Muenchen (Germany)) L. (Fraunhofer-Institut fuer Festkoerpertechnologie (IFT) Csepregi and Ottobrunn (Germany). Information und Dokumentation Messerschmitt-Boelkow-Blohm G.m.b.H. (MBB)


SIGLECopy held by FIZ Karlsruhe; available from UB/TIB Hannover / FIZ - Fachinformationszzentrum Karlsruhe / TIB - Technische InformationsbibliothekDEGerman

Topics: 07D - Physical chemistry
Year: 1989
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Provided by: OpenGrey Repository
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