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In-situ IR spectroscopy to study anodic oxidation of Si(111) in KOH solution

By H.G.G. Philipsen, J.-N. Chazalviel, P. Allongue, F. Ozanam and J.J. Kelly

Abstract

Fourier Transform Infrared (FTIR) spectroscopy was used to study in-situ the anodic oxidation of n-type Si(111) in KOH solution. Changes in surface chemistry were followed during oxide growth. The results are considered on the basis of a model developed from electrochemical measurements

Year: 2007
OAI identifier: oai:dspace.library.uu.nl:1874/27071
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