Integrated Circuit (Ic) And Photomask Images Processing Technology

Abstract

The integrated circuit and photomask images processing technology is proposed. This technology allows to perform the restoration of the integrated-circuit metallization layout and the mask artwork from the images of IC metallization layers or photomask set correspondingly. It can be applied for the tasks of integrated circuits redesign and automated visual inspection of integrated circuits and photomask production

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oai:elib.bsu.by:123456789/50846Last time updated on 6/8/2016

This paper was published in BSU Digital Library.

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