Article thumbnail

Post-etch template removal strategy for reduction of plasma induced damage in spin-on OSG low-k dielectrics

By Mikhail Krishtab, Kris Vanstreels, Mikhaïl Baklanov and Stefan De Gendt


status: publishe

Year: 2015
DOI identifier: 10.1109/iitc-mam.2015.7325642
OAI identifier:
Provided by: Lirias
Download PDF:
Sorry, we are unable to provide the full text but you may find it at the following location(s):
  • (external link)
  • Suggested articles

    To submit an update or takedown request for this paper, please submit an Update/Correction/Removal Request.