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Post-etch template removal strategy for reduction of plasma induced damage in spin-on OSG low-k dielectrics

By Mikhail Krishtab, Kris Vanstreels, Mikhaïl Baklanov and Stefan De Gendt

Abstract

status: publishe

Year: 2015
DOI identifier: 10.1109/iitc-mam.2015.7325642
OAI identifier: oai:lirias.kuleuven.be:123456789/524759
Provided by: Lirias
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