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Characteristic features of an apparatus for plasma immersion ion implantation and physical vapour deposition

By Bernd (Prof.) Rauschenbach

Abstract

Characteristic features of an apparatus for plasma immersion ion implantation and physical vapour deposition / B. Rauschenbach ... - In: Surface and coatings technology. 93. 1997. S. 175-18

Year: 1997
OAI identifier: oai:uni-augsburg.opus-bayern.de:24525
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