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Structural and compositional reversible phase transitions on low-index

By U. Starke, J. Schardt, W. Weiss, W. Meier, C. Polop, P. L. de Andres and K. Heinz

Abstract

The (100), (110), and (111) surfaces of Fe3Si have been studied by quantitative Low-Energy Electron Diffraction and Auger Electron Spectroscopy. Reversible phase transitions between the D03 and the CsCl structure develop upon annealing, triggered by a substantial reversible surface segregation of Si. On all surfaces, Si termination is preferred either by realizing a topmost Si layer whenever the choice between Si and Fe exists, or by direct Si occupation of nominal Fe sites. Similarities to epitaxial iron silicide films structural behaviour are identified

Publisher: 'IOP Publishing'
Year: 2003
DOI identifier: 10.1209/epl/i2001-00593-6
OAI identifier: oai:edpsciences.org:dkey/10.1209/epl/i2001-00593-6
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