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Single-step definition of channel waveguides with integral Bragg gratings in germanosilica-on-silicon wafers by direct UV writing

By C.B.E. Gawith, G.D. Emmerson, S.P. Watts, V. Albanis, M. Ibsen, R.B. Williams, P.G.R. Smith, S.G. McMeekin, J.R. Bonar and R.I. Laming


We present a single-step technique for defining channel waveguides with internal Bragg gratings in photosensitive germanosilica-on-silicon using two interfering focussed UV beams. Early devices exhibit reflection intensities of 80% with <0.15nm bandwidth

Topics: QC, TK
Year: 2003
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Provided by: e-Prints Soton
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