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Single-step definition of channel waveguides with integral Bragg gratings in germanosilica-on-silicon wafers by direct UV writing

By C.B.E. Gawith, G.D. Emmerson, S.P. Watts, V. Albanis, M. Ibsen, R.B. Williams, P.G.R. Smith, S.G. McMeekin, J.R. Bonar and R.I. Laming

Abstract

We present a single-step technique for defining channel waveguides with internal Bragg gratings in photosensitive germanosilica-on-silicon using two interfering focussed UV beams. Early devices exhibit reflection intensities of 80% with <0.15nm bandwidth

Topics: QC, TK
Year: 2003
OAI identifier: oai:eprints.soton.ac.uk:41662
Provided by: e-Prints Soton
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