Article thumbnail
Location of Repository

Conformality analysis of the archetype aluminium oxide ALD process in 3rd-generation silicon-based lateral high-aspect-ratio test structures

By Oili M.E. Ylivaara, Jihong Yim, Markku Ylilammi, Mikko Utriainen and L. Riikka Puurunen
Topics: OtaNano, /fi/minedu/virta/publicationtypes/v1, V1 Non-published/full refereed conference article, /fi/minedu/virta/openaccess/0, 0 Not Open Access, /fi/minedu/virta/scienceareas/216, 216 Materials engineering, /fi/minedu/virta/scienceareas/114, 114 Physics
Year: 2019
OAI identifier: oai:cris.vtt.fi:publications/f5e061f9-2c1a-468c-b4c5-8a316107ab88
Provided by: VTT Research System
Download PDF:
Sorry, we are unable to provide the full text but you may find it at the following location(s):
  • https://cris.vtt.fi/en/publica... (external link)
  • https://www.eurocvd-balticald2... (external link)
  • Suggested articles


    To submit an update or takedown request for this paper, please submit an Update/Correction/Removal Request.