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Conformality analysis of the archetype aluminium oxide ALD process in 3rd-generation silicon-based lateral high-aspect-ratio test structures

By Oili M.E. Ylivaara, Jihong Yim, Markku Ylilammi, Mikko Utriainen and L. Riikka Puurunen
Topics: OtaNano, /fi/minedu/virta/publicationtypes/v1, V1 Non-published/full refereed conference article, /fi/minedu/virta/openaccess/0, 0 Not Open Access, /fi/minedu/virta/scienceareas/216, 216 Materials engineering, /fi/minedu/virta/scienceareas/114, 114 Physics
Year: 2019
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Provided by: VTT Research System
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