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Patterning highly ordered arrays of complex nanofeatures through EUV directed polarity switching of non chemically amplified photoresist

By RS Brian, FS Robert, I Takashi, PS Daniel, F Bernard, P Naulleau, CN Anderson, CN Anderson, M Seong-Yun, LB Kimberly, RF Pease, T Itani, H Tsubaki, PK Kulshreshtha, S Ma, K Maruyama, IB Baek, V Singh, VSV Satyanarayana, VSV Satyanarayana, V Singh, V Kalyani, R Bonam, IT Peter, G Ramakrishnan, Y Anguang, CT Victor, KE Gonsalves, M Wang, L Chen, KJ Lawrie, R Murillo, H Sumio, V Ankur, X Chen, G Jochen, TW Ebbesen, C Dana, DR Claudio, BA Samia, S Mathieu, F Gibbons and Y Jinxing
Publisher: 'Springer Science and Business Media LLC'
DOI identifier: 10.1038/srep22664
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Provided by: Crossref
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