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SiC epitaxy growth using chloride-based CVD

By Anne Henry, Stefano Leone, Franziska C. Beyer, Henrik Pedersen, Olof Kordina, Sven Andersson and Erik Janzén
Publisher: Elsevier BV
Year: 2011
DOI identifier: 10.1016/j.physb.2011.09.063
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Provided by: MUCC (Crossref)
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