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Efficient prototyping of large-scale pdms and silicon nanofluidic devices using pdms-based phase-shift lithography

By Y. Viero, Q. He, L. Mazenq, H. Ranchon, J. Y. Fourniols and A. Bancaud
Publisher: Springer Science and Business Media LLC
Year: 2011
DOI identifier: 10.1007/s10404-011-0888-0
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Provided by: MUCC (Crossref)
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