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Plasma Etching in Microelectronics

By Maxime Darnon

Abstract

International audienc

Topics: [SPI.NANO]Engineering Sciences [physics]/Micro and nanotechnologies/Microelectronics
Publisher: 'Elsevier BV'
Year: 2017
DOI identifier: 10.1016/B978-1-78548-096-6.50002-X
OAI identifier: oai:HAL:hal-02338424v1
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