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AN INVESTIGATION OF OPERATING METHODS FOR 0.25 MICRON SEMICONDUCTOR MANUFACTURING

By Ed. J. M. Cbarnes, D. J. Morrice, D. T. Brunner, J. J. Sv. Rain, James F. Hallas, Jane D. Kim, Carolyn Internicola and Charles T. Mosier

Abstract

This study investigates a number of operational issues associated with the control of microprocessor fabrication facilities, specifically expanding the domain of previous research to investigate the effects of lot size, test wafer proportion, and tool productivity on wafer fabrication performance. Response variables included cost and production performance metrics. 1

Year: 2014
OAI identifier: oai:CiteSeerX.psu:10.1.1.414.9623
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