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By H. Shin, W. Zhu and V. M. Donnelly

Abstract

� Control of ion energy gy distribution (IED) � Experimental set-up for near-threshold etching � Results and Discussion � Etching threshold, etching rate & yield � � Sub Sub-threshold threshold etching � Photo-assisted etchin

Topics: eV
Year: 2013
OAI identifier: oai:CiteSeerX.psu:10.1.1.352.8106
Provided by: CiteSeerX
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