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Silicon based micro-optical collimating element for mid-infrared Quantum Cascade Lasers

By Pierre-yves Baroni, Michel Rochat and Antoine Müller


Abstract: A realization of a high numeric aperture, aspheric, silicon based collimating element for the mid-infrared (4 – 14 microns) Quantum Cascade Lasers, suited for mass production using computer driven reactive ion etching is presented. © 2012 EOS OSJ 1

Topics: Infrared micro-optics, Quantum Cascade Lasers, Reactive Ion Etching, Mass production
Year: 2013
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