Article thumbnail

BIAMS 2006 The 8th International Workshop on Beam Injection Assessment of Microstructures in Semiconductors

By M. Breese, O. Breitenstein, A. Cavallini, M. Kittler, S.G. Konnikov, J. Piqueras, Z.J. Radzimski, T. Sekiguchi, B. Sieber, J.W. Steeds, N. Tabet, H. Tomokage, M. Troyon and E. Yakimov

Abstract

International scientific society has carried out the Conference Beam Injection Assessment of Microstructure in Semiconductors during 17 years starting from 1988. During this period the Conference was held in France (1988, 1991, and 2003), Italy (1993), Spain (1993, 1996), Germany (1998), Japan (2000). Appearance of these Conferences was due to the extremely intensive development of Hi-Tech for micro- nano- and optoelectronics and corresponding progress of characterization nondestructive local techniques caused by and adequate to this global event. At the same time the development of techniques based on the fine electron, photon, x-ray, ion, atomic, molecular beams and metallic nanoprobes is performed in the World. This is the scanning and transmission electron microscopy, tunneling, atomic-force and confocal microscopy, x-ray ion microanalysis, Auger and photoelectron spectroscopy, etc. Definitely these techniques are widely used, developed and specialized for characterization of nanomaterials, structures and devices for advanced electronics at any stage of fabrication

Year: 2006
OAI identifier: oai:cris.unibo.it:11585/42245
Download PDF:
Sorry, we are unable to provide the full text but you may find it at the following location(s):
  • http://hdl.handle.net/11585/42... (external link)
  • Suggested articles


    To submit an update or takedown request for this paper, please submit an Update/Correction/Removal Request.