Article thumbnail

Quantum state control interference lithography and trim

By Robert D. Frankel, Bruce W. Smith and Andrew Estroff

Abstract

double patterning for 32-16 nm lithograph

Topics: Microlithography, nanolithography, double patterning, quantum state control, and interferometric
Year: 2012
OAI identifier: oai:CiteSeerX.psu:10.1.1.226.4438
Provided by: CiteSeerX
Download PDF:
Sorry, we are unable to provide the full text but you may find it at the following location(s):
  • http://citeseerx.ist.psu.edu/v... (external link)
  • http://www.rit.edu/kgcoe/micro... (external link)

  • To submit an update or takedown request for this paper, please submit an Update/Correction/Removal Request.

    Suggested articles