Skip to main content
Article thumbnail
Location of Repository

ISBN 80-86732-59-2 © MATFYZPRESS AFM Study of Hydrocarbon Thin Films

By M. Valtr, I. Ohlídal and P. Klapetek


Abstract. In this paper atomic force microscope (AFM) study on hydrocarbon thin films was performed. Thin films were prepared using plasma enhanced vapour deposition (PECVD) in pulsed regime. The aim was to see whether the surface roughness of the films changes with the duty cycle. The AFM is a direct measuring technique for scanning surfaces of samples. From obtained images one can compute many quantities characterizing the surface. It is shown that the root mean square (RMS) value of the heights seems to be independent on duty cycle except for region from 10 to 15 %. Outside of this region the RMS values of the heights vary in the range from 6,3 to 14,8 nm, while for 10 % it is 96,3 nm and for 15 % it’s 61,7 nm. Unfortunately also the deposition time, which corresponds to different thicknesses of the films, was varied. This could be the reason for many times higher roughness inside the region. Further study of this problem would be needed

Year: 2011
OAI identifier: oai:CiteSeerX.psu:
Provided by: CiteSeerX
Download PDF:
Sorry, we are unable to provide the full text but you may find it at the following location(s):
  • (external link)
  • (external link)
  • Suggested articles

    To submit an update or takedown request for this paper, please submit an Update/Correction/Removal Request.