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involve Atomic Force Microscopy (AFM), Dip

By P. Kohli, R. R. Pradeep, J. Wolff, R. Zakeri, C. Patel, K. Tadinisa, S. Aouadi, H. Wang and C. Trautmann


Patterning at submicron/nanometer resolution has a wide range of applications in a variety of fields. On this length scale, it is difficult to make patterns with conventional photolithography and it usually involves expensive and complex instrumentation. Some of the present technique

Year: 2010
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