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involve Atomic Force Microscopy (AFM), Dip

By P. Kohli, R. R. Pradeep, J. Wolff, R. Zakeri, C. Patel, K. Tadinisa, S. Aouadi, H. Wang and C. Trautmann

Abstract

Patterning at submicron/nanometer resolution has a wide range of applications in a variety of fields. On this length scale, it is difficult to make patterns with conventional photolithography and it usually involves expensive and complex instrumentation. Some of the present technique

Year: 2010
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