Skip to main content
Article thumbnail
Location of Repository

High Resolution Electron Beam Lithography and DNA Nano-patterning for Molecular QCA

By Wenchuang Hu, Koshala Sarveswaran, Marya Lieberman, Gary H. Bernstein and Senior Member

Abstract

Abstract—Electron beam lithography (EBL) patterning of poly(methylmethacrylate) (PMMA) is a versatile tool for defining molecular structures on the sub-10-nm scale. We demonstrate lithographic resolution to about 5 nm using a cold-development technique. Liftoff of sub-10-nm Au nanoparticles and metal lines proves that cold development completely clears the PMMA residue on the exposed areas. Molecular liftoff is performed to pattern DNA rafts with high fidelity at linewidths of about 100 nm. High-resolution EBL and molecular liftoff can be applied to pattern Creutz–Taube molecules on the scale of a few nanometers for quantum-dot cellular automata. Index Terms—Au nanoparticles, DNA tiling, electron beam lithography (EBL), liftoff, metal grains, molecular electronics, nanofabrication, quantum-dot cellular automata (QCA)

Year: 2005
OAI identifier: oai:CiteSeerX.psu:10.1.1.134.8023
Provided by: CiteSeerX
Download PDF:
Sorry, we are unable to provide the full text but you may find it at the following location(s):
  • http://citeseerx.ist.psu.edu/v... (external link)
  • http://www.utdallas.edu/~wxh05... (external link)
  • Suggested articles


    To submit an update or takedown request for this paper, please submit an Update/Correction/Removal Request.