Lattice location and thermal stability of implanted nickel in silicon studied by on-line emission channeling

By D. J. Silva, U. Wahl, J. G. Correia, L. M. C. Pereira, L. M. Amorim, M. R. da Silva, E. Bosne and J. P. Araújo

Publisher: AIP Publishing

Year: 2014

DOI identifier: 10.1063/1.4861142

OAI identifier:

Provided by: MUCC (Crossref)

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