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Approaching the low-temperature limit in nucleation and two-dimensional growth of fcc (100) metal films Ag/Ag(100)

By S. Frank, H. Wedler, R. J. Behm, J. Rottler, P. Maass, K. J. Caspersen, C. R. Stoldt, P. A. Thiel and J. W. Evans
Publisher: 'American Physical Society (APS)'
Year: 2002
DOI identifier: 10.1103/physrevb.66.155435
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Provided by: MUCC (Crossref)
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