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Comparative Characteristics of Stress and Structure of TiN and Ti0.5-xAl0.5YxN Coatings Prepared by Filtered Vacuum-Arc PIIID Method

By V.V. Vasyliev, A.A. Luchaninov, E.N. Reshetnyak and V.E. Strelnitskij

Abstract

A comparative study of the structure and stress state of Ti0.5-xAl0.5YxN and TiN coatings deposited under\ud identical conditions from the filtered vacuum-arc plasma under high voltage pulsed bias potential on\ud the substrate was carried out. It was found that for Ti0.5Al0.5N coatings the dependence of the residual\ud stress on the amplitude of the pulsed voltage potential is non-monotonic with a minimum when the amplitude\ud is of 1 kV. As for TiN films, a monotonic decrease in the level of residual stresses takes place when the\ud amplitude of the potential is increased in the range 0-2.5 kV. Non-monotonic dependence for multicomponent\ud coatings Ti-Al-Y-N may occur due to the possibility of phase transition associated with the decay\ud of the supersaturated solid solution (Ti,Al)N stimulated by high energy ion bombardment. When you are citing the document, use the following link http://essuir.sumdu.edu.ua/handle/123456789/3491

Topics: Nitride coatings, Solid solution, Filtered vacuum arc deposition, Pulsed substrate bias, Residual stress
Publisher: Sumy State University
Year: 2012
OAI identifier: oai:essuir.sumdu.edu.ua:123456789/34913
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