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Magnetoresistance between oxidized Co-rich particles grown by high current electrochemical deposition

By M. Plaza, L. Perez, M.C. Sanchez, Amalio Fernandez-Pacheco and J.M. De Teresa

Abstract

In this work, we present Co-rich particles which have been successfully grown by high current electroplating. This technique produces particles with a Co–Cu core surrounded by an oxidized shell. This shell has two consequences: on the one hand, it electrically isolates the magnetic core and acts as a tunnel barrier; on the other hand, the ferromagnetic/antiferromagnetic structure causes an exchange bias coupling when cooling the particles in the presence of magnetic field. We also present magnetoresistance measurements up to 9 T. At low field, direct tunnelling between magnetic cores through the insulating layer properly explains the experimental observations, but, at high field, a linear contribution dominates the MR. The latter behaviour can be understood by assuming second-order tunnelling

Publisher: 'Elsevier BV'
Year: 2009
DOI identifier: 10.1016/j.ssc.2009.08.024
OAI identifier: oai:eprints.gla.ac.uk:185216
Provided by: Enlighten
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