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Influence of light-curing distance on degree of conversion and cytotoxicity of etch-and-rinse and self-etch adhesives

By Florian J. Wegehaupt, Nancy Lunghi, Georgios N. Belibasakis and Thomas Attin
Publisher: 'Springer Science and Business Media LLC'
Year: 2016
DOI identifier: 10.1186/s12903-016-0239-3
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Provided by: MUCC (Crossref)
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