Accurate mask model implementation in optical proximity correction model for 14-nm nodes and beyond

Zine El Abidine, Nacer; Sundermann, Frank; Yesilada, Emek; Farys, Vincent; Huguennet, Frederic; Armeanu, Ana-Maria; Bork, Ingo; Chomat, Michael; Buck, Peter; Schanen, Isabelle

oai:HAL:hal-02025168v1

Accurate mask model implementation in optical proximity correction model for 14-nm nodes and beyond

Authors: Nacer Zine El Abidine
Frank Sundermann
Emek Yesilada
Vincent Farys
Frederic Huguennet
Ana-Maria Armeanu
Ingo Bork
Michael Chomat
Peter Buck
Isabelle Schanen
Publication date: April 1, 2016
Publisher: Society of Photo-optical Instrumentation Engineers

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HAL Université de Savoie

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oai:HAL:hal-02025168v1Last time updated on 3/19/2019

This paper was published in HAL Université de Savoie.

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