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Complementary Metrology within a European Joint Laboratory

By Andreas Nutsch, Burkhard Beckhoff, Roswitha Altmann, Jakob Van den Berg, D. Giubertoni, Philipp Hoenicke, M. Bersani, Andreas Leibold, F. Meirer, Matthias Müller, G. Pepponi, Michael Otto, P. Petrik, M. Reading, Lothar Pfitzner and Heiner Ryssel

Abstract

The continuous dimensional reduction drives the development of metrology, analysis and characterization for nano and micro electronics. An enormous worldwide R&D effort focuses on the understanding and controlling materials properties and dimensions at atomic level. Crucial for groundbreaking new developments is the availability of appropriate analytical infrastructures providing techniques with information depths well adapted to the nanoscaled objects of interest. This requires widely accessible, independent complementary metrology, analytical techniques, and characterization. For example new materials and the demand of improved detection sensitivities for contaminants provide huge challenges for the capabilities of current analysis equipment and expertise. At the same time, the availability of complementary competences is crucial for advancement of analytical methodologies through cross-comparison, round-robin, and benchmarking of results. This paper describes the formation of an independent analytical infrastructure within Europe having the expertise and competence to solve metrology problems for development of nanotechnologies. Furthermore, a strategy is shown to establish independently operating ‘Golden Laboratories’ for complementary and reliable metrology, analysis, and characterization adapted to the requirements of industrial partner

Topics: QC
Publisher: Scitec Publications
Year: 2009
DOI identifier: 10.4028/www.scientific.net/ssp.145-146.97
OAI identifier: oai:eprints.hud.ac.uk:12250
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