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Time-Resolved In-Situ Spectroscopic Monitoring of the CVD of Tin Oxide onto a Glass Substrate

By R. J. Holdsworth, P.A. Martin, D. Raisbeck, J. Rivero, H.E. Sanders, D. Sheel and M.E. Pemble

Abstract

Near-infrared diode laser absorption spectroscopy has been demonstrated as an in-situ, non-invasive probe for use with a CVD reactor. The technique has been applied to the CVD of tin oxide onto a glass substrate, and by monitoring the evolution of methane in the reactor, it has been shown that the concentration of methane is correlated with the deposition rate of the tin oxide film. This illustrates the powerful possibilities for monitoring thin film production and properties, in-situ, during deposition

Topics: Q1, QD
Publisher: Wiley
Year: 2001
DOI identifier: 10.1002/1521-3862(200101)7:1<39::aid-cvde39>3.0.co;2-z
OAI identifier: oai:eprints.hud.ac.uk:2260
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