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Sputtered flux distribution on the substrate in electron cyclotron resonance sputtering simulation and experimental study

By Deenamma K Vargheese and Mohan G Rao

Abstract

Electron cyclotron resonance plasma based sputtering is characterized by low pressure operation with high ion density. The distribution of sputtered flux on the substrate at different pressures and target–substrate distances has been simulated using Monte Carlo methods and compared with experimental results. It has been shown that due to cylindrical geometry of the target, at low pressures, the variation as a function of distance is different from conventional sputtering. At high pressures, however, the uniformity of sputtered flux increases with the target–substrate distance. Using the simulated data the variation of the thickness with sputtering pressure and target–substrate distance has been studied

Topics: Instrumentation Appiled Physics
Publisher: American Institute of Physics
Year: 2000
OAI identifier: oai:eprints.iisc.ac.in:15585
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