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Influence of Discharge Power Level an the Properties of Hydroxyapatite Films Deposited on Ti6a14v with Rf Magnetron Sputtering

By K. van Dijk, H.G. Schaeken, J.C.G. Wolke, C.H.M. Maree, F.H.P.M. Habraken, J. Verhoeven and J.A. Jansen

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Publisher: John wiley & sons inc
Year: 1995
OAI identifier: oai:repository.ubn.ru.nl:2066/28512
Provided by: Radboud Repository
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