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Sintesa Fluorinated Tin Oxide (FTO) Menggunakan Prekursor Ramah Lingkungan dan Penambahan Graphene dengan Metode Deposisi Spray Coating untuk Aplikasi Material Konduktif Transparan

Abstract

Fluorine doped tin oxide (FTO) films were fabricated on a glass substrate by a spray coating deposition methode. Non-toxic SnF2 was used as fluorine source to replace toxic HF or NH4F. Effect of SnF2 content, 0 – 10 mol% and 115 ppm graphene as comparison to the fluor content on the substrate, on structure, electrical resistivity, optical transmittance of the films and morfology were investigated using X-ray diffraction (XRD), Multimeter, UV–vis spectra and Scanning Electron Microscopy (SEM). Structural analysis revealed that the films are amorf with crystal structure. Grain size varies from 501 nm - 175 nm with increasing fluorine concentration, which in fact critically impacts resultant electrical and optical properties. The 300 °C-annealed FTO film containing 10 mol% SnF2 shows the lowest electrical resistivity 14,1 x 10-4 Ωcm, on 5x deposition repeat, optical transmittance 86,4% on 0 mol% SnF2 with once deposition repeat. The highest figure of merit 0,0453 x 104 Ω-1cm-1 which is used for standart of best quality of transparent conductive oxide (TCO). Because of the promising electrical and optical properties, F-doped thin films prepared by this green process are well-suited for use in all aspects of transparent conducting oxide

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oai:neliti.com:200672Last time updated on 1/7/2018

This paper was published in Neliti.

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